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Lithography System

Service Provider of a wide range of services which include uv exposure systems, photolithography equipment mask aligners, maskless laser lithography system and laser lithography system.

UV Exposure Systems

  • UV Exposure Systems
  • UV Exposure Systems
  • UV Exposure Systems
UV Exposure Systems
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Rs 15,00,000  / PiecePrice on Request

Minimum Order Quantity: 1 Piece

Product Brochure

Web Width Range100 mm
Power50 W
Size220x230x320 mm
Voltage110/220 V
Weight9 kg
Wavelength365 nm
Exposure Time0.1-100 sec
Exposure Area100 mm Diameter
Power Density0.2-20 milli watt/cm^2
Homogenity<5%
Light Divergence<2%
BrandMutech Microsystems
Mutech micro systems micro exposer is a High Value UV exposing system designed for microfabrication applications.It allows the user to perform fast lithography processes on samples and substrates.
The system consists of an UV 365 nm parallel LED light source and a sliding tray where you can put your photo lithography mask and sample to expose.
A variety of custom holders and customization can be provided for your application.
Main applications The micro exposeris a robust system (all metal body structure), especially designed for easy use, low maintenance requirements and fast single layer device fabrication. Custom sample holders can be ordered for special substrates and samples, such as not flat or flexible substrates. The micro exposer is ideal for scaling from lab fabrication to low volume commercial production.

Additional Information:

  • Production Capacity: NA
  • Delivery Time: 6-8 weeks

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Photolithography Equipment Mask Aligners

  • Photolithography Equipment Mask Aligners
  • Photolithography Equipment Mask Aligners
  • Photolithography Equipment Mask Aligners
Photolithography Equipment Mask Aligners
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Rs 67,00,000  / UnitPrice on Request

Product Brochure

Web Width Range100 mm
Size350x490x470 mm
BrandMutech
Camera Resolution1920 x 1080
Weight19 kg
Power250 W
Voltage110-220 V
Wavelength365 nm
Display7 inch LCD
Stage Step0.31um/step
Accuracy1 um
Mutech micro systems micro Aligner is a compact high value UV mask aligner designed for micro fabrication applications.It allows for easy fabrication of multi layer devices on a multitude of photo resists, with excellent exposure quality.
The easy to use, 7 inch touchscreen based control allows the user to align using the calibrated digital microscope and the X-Y-R micrometer based alignment stage.
The fully electronic wafer pressure and gap control allows for easy alignment and very high repeatability of the exposure conditions between processes.
Main applications The micro Aligner is ideal for the fabrication of high level systems for research applications. Main applications range from micro fluidics, optics and biotechnology to microelectronic devices. It provides the user with fast multi layer device fabrication capabilities thanks to its high resolution and high accuracy alignment.

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Maskless Laser Lithography System

  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
  • Maskless Laser Lithography System
Maskless Laser Lithography System
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Rs 35,00,000  / PiecePrice on Request

Product Brochure

Laser TypeDiode
Voltage230 V
BrandMutech
Usage/ApplicationLaser Lithography
Typical Writing Speed100-120 mm/sec
Laser Wavelength405 nm
Supported FormatsPNG, GDSII

Mutech microsystems microlaser is an affordable direct laser lithography writer, oriented to universities and research facilities looking to entering into micro or nano electronics. It writes on a photosensitive resist coated surface with a laser at submicron pixel resolution on big areas. You can write anything from photomasks to research prototypes for basic or applied science. Microlaser comes with a confocal integrated camera and yellow illumination to focus the laser, align the writing with existing features and to inspect the designs after writing.

 

Applications: Direct laser lithography greatly reduces costs and execution times in areas such as microfluidics, microelectronics, micromechanics and material science research, by eliminating the dependence of external suppliers to produce photomasks.

 

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Laser Lithography System

  • Laser Lithography System
  • Laser Lithography System
  • Laser Lithography System
  • Laser Lithography System
Laser Lithography System
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Rs 30,00,000  / UnitPrice on Request

Minimum Order Quantity: 1 Unit

Product Brochure

Writing Area100*92mm^2
Resolution32000 DPI
Feature Size5-10 microns
Integrated confocal microscopefor laser focusing,aligning and inspection
.Laser spot sizecan be changed using industry standard microscope objectives
Tilted/warped substrate compensationvia 3-point focus or 4-point bilinear measurement
μLaser is a high value direct laser lithography writer, oriented to universities and research facilities looking to expand their capabilities.

It writes on a photosensitive resist coated surface with a laser at submicron pixel resolution on big areas.


You can write anything from photomasks to research prototypes for basic or applied science

Microlaser comes with a confocal integrated camera and yellow illumitation to focus the laser, align the writing with existing features and to inspect the designs after writing.

Additional Information:

  • Production Capacity: 1
  • Delivery Time: 8 Weeks

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