Usage/Application | Laser Lithography |
Laser Type | Diode |
Voltage | 230 V |
Brand | Mutech |
Typical Writing Speed | 100-120 mm/sec |
Laser Wavelength | 405 nm |
Supported Formats | PNG, GDSII |
Mutech microsystems microlaser is an affordable direct laser lithography writer, oriented to universities and research facilities looking to entering into micro or nano electronics. It writes on a photosensitive resist coated surface with a laser at submicron pixel resolution on big areas. You can write anything from photomasks to research prototypes for basic or applied science. Microlaser comes with a confocal integrated camera and yellow illumination to focus the laser, align the writing with existing features and to inspect the designs after writing.
Applications: Direct laser lithography greatly reduces costs and execution times in areas such as microfluidics, microelectronics, micromechanics and material science research, by eliminating the dependence of external suppliers to produce photomasks.
Size | 350x490x470 mm |
Brand | Mutech |
Camera Resolution | 1920 x 1080 |
Weight | 19 kg |
Power | 250 W |
Voltage | 110-220 V |
Wavelength | 365 nm |
Display | 7 inch LCD |
Stage Step | 0.31um/step |
Accuracy | 1 um |
Size | Upto 12" |
Material | Quartz, sodalime, glass |
Minimum Feature Size | Upto 0.5um |
CD tolerance | 0.1um |
Defect Density | <1psi@1.0 |
Address Size | 0.005 |
Photomask Produces High Quality Masks for:Electronics( Bump Mask,Field Effect Transistors ,Hybrid Circuits etc.), display optical products and other applications like Hard Disk Imaging,Medical Products, Metal Etched Parts, Micromachining and many more.
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Minimum Order Quantity | 1 Piece |
Power | 50 W |
Size | 220x230x320 mm |
Voltage | 110/220 V |
Weight | 9 kg |
Wavelength | 365 nm |
Exposure Time | 0.1-100 sec |
Exposure Area | 100 mm Diameter |
Power Density | 0.2-20 milli watt/cm^2 |
Homogenity | <5% |
Light Divergence | <2% |
Brand | Mutech Microsystems |