Bengaluru, Karnataka
GST No. 29AABCP9422H1Z8
Call 08048609186 92% Response Rate
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Minimum Order Quantity: 1 Piece
Product Brochure
| Web Width Range | 100 mm |
| Power | 50 W |
| Size | 220x230x320 mm |
| Voltage | 110/220 V |
| Weight | 9 kg |
| Wavelength | 365 nm |
| Exposure Time | 0.1-100 sec |
| Exposure Area | 100 mm Diameter |
| Power Density | 0.2-20 milli watt/cm^2 |
| Homogenity | <5% |
| Light Divergence | <2% |
| Brand | Mutech Microsystems |
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Product Brochure
| Web Width Range | 100 mm |
| Size | 350x490x470 mm |
| Brand | Mutech |
| Camera Resolution | 1920 x 1080 |
| Weight | 19 kg |
| Power | 250 W |
| Voltage | 110-220 V |
| Wavelength | 365 nm |
| Display | 7 inch LCD |
| Stage Step | 0.31um/step |
| Accuracy | 1 um |
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Product Brochure
| Laser Type | Diode |
| Voltage | 230 V |
| Brand | Mutech |
| Usage/Application | Laser Lithography |
| Typical Writing Speed | 100-120 mm/sec |
| Laser Wavelength | 405 nm |
| Supported Formats | PNG, GDSII |
Mutech microsystems microlaser is an affordable direct laser lithography writer, oriented to universities and research facilities looking to entering into micro or nano electronics. It writes on a photosensitive resist coated surface with a laser at submicron pixel resolution on big areas. You can write anything from photomasks to research prototypes for basic or applied science. Microlaser comes with a confocal integrated camera and yellow illumination to focus the laser, align the writing with existing features and to inspect the designs after writing.
Applications: Direct laser lithography greatly reduces costs and execution times in areas such as microfluidics, microelectronics, micromechanics and material science research, by eliminating the dependence of external suppliers to produce photomasks.
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Minimum Order Quantity: 1 Unit
Product Brochure
| Writing Area | 100*92mm^2 |
| Resolution | 32000 DPI |
| Feature Size | 5-10 microns |
| Integrated confocal microscope | for laser focusing,aligning and inspection |
| .Laser spot size | can be changed using industry standard microscope objectives |
| Tilted/warped substrate compensation | via 3-point focus or 4-point bilinear measurement |
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